October 2015 – The 4th Annual US-China IP Conference: Best Practices for Innovation and Creativity (“创新驱动发展的最佳实践”)

October 8 & 9, 2015
The Claremont Hotel Club & Spa
41 Tunnel Road
Berkeley, CA, 94705
The Berkeley Center for Law & Technology, Loyola Law School, Los Angeles, and Renmin University of China Law School organize this annual conference to compare developments and trends in two countries critical for any IP creation and protection strategy: China and the United States. Leading scholars, government officials and practicing lawyers from China will join US experts to examine vital current topics including:
* Opportunities and Challenges in US-China Film Co-Production and Other Media
* New Trends and Legal Issues in Transnational Technology Investment
* Specialized IP Courts
* Recent Developments in Copyright: Legislation and Cases
* Recent Developments in Patents: Legislation and Cases
* Cross-border IP Enforcement
Registration opens August 19. Additional conference details to be announced.
UC Berkeley School of Law certifies that this activity is approved for 9.75 hours CLE credit by the State Bar of California.


Notice – Latest updates on COVID-19 policies and resources for the UC Berkeley campus community. — View Details